MOCVD OF HIGH-QUALITY LUBA2CU3O7-DELTA THIN-FILMS

Authors
SAMOYLENKOV SV GORBENKO OY GRABOY IE KAUL AR SVETCHNIKOV VL ZANDBERGEN HW
Citation
Sv. Samoylenkov et al., MOCVD OF HIGH-QUALITY LUBA2CU3O7-DELTA THIN-FILMS, Acta Physica Polonica. A, 92(1), 1997, pp. 243-247
Citations number
13
Categorie Soggetti
Physics
Journal title
Acta Physica Polonica. A → ACNP
ISSN journal
05874246
Volume
92
Issue
1
Year of publication
1997
Pages
243 - 247
Database
ISI
SICI code
0587-4246(1997)92:1<243:MOHLT>2.0.ZU;2-V
Abstract
Epitaxial LuBa2Cu3O7-delta films were prepared by flash evaporation MO CVD on LaAlO3, SrTiO3, LaSrGaO4 and ZrO2(Y2O3) single crystalline subs trates. The highest T-c and j(c) (77 K, 100 Oe) values were 89 K, 2.7 x 10(6) A/cm(2) (LaAlO3) and 88 K, 1.5 x 10(6) A/cm(2) (SrTiO3) respec tively. The occurrence of secondary phases inclusions in LuBa2Cu3O7-de lta films correlates with the possibility of epitaxial relations with the film matrix or the substrate.