K. Frohlich et al., GROWTH AND STRUCTURE OF BUFFER LAYERS FOR HIGH-TEMPERATURE SUPERCONDUCTING FILMS, Acta Physica Polonica. A, 92(1), 1997, pp. 255-258
We have studied thin CeO2 buffer layers prepared by aerosol MOCVD on (
<1(1)over bar 02>) Al2O3 substrate at high deposition temperature, Td
= 900 degrees C. A texture analysis by X-ray diffraction showed a high
degree of epitaxial character of CeO2 films. A study of the microstru
cture by transmission electron microscopy revealed that the CeO2 films
are in a relaxed state being composed of slightly misoriented blocks
surrounded by dislocations. The films are smooth, giving mean square r
oot values of the surface roughness measured by atomic force microscop
y up to 1 nm.