A new, versatile architecture is presented for microfluidic devices made en
tirely from glass, for use with reagents which would prove highly corrosive
for silicon. Chips consist of three layers of glass wafers bonded together
by fusion bonding. On the inside wafer faces a network of microfluidic cha
nnels is created by photolithography and wet chemical etching. Low dead-vol
ume fluidic connections between the layers are fabricated by spark-assisted
etching (SAE), a computer numerical controlled (CNC)-like machining techni
que new to microfluidic system fabrication. This method is also used to for
m a vertical, long path-length, optical cuvette through the middle wafer fo
r optical absorbance detection of low-concentration compounds. Advantages o
f this technique compared with other, more standard, methods are discussed.
When the new glass-based device for flow-injection analysis of ammonia was
compared with our first-generation chips based on silicon micromachining, c
oncentration sensitivity was higher, because of the longer pathlength of th
e optical cuvette. The dependence of dispersion on velocity profile and on
channel cross-sectional geometry is discussed. The rapid implementation of
the devices for an organic synthesis reaction, the Wittig reaction, is also
briefly described.