Evaluation of Si(Li) detectors by a combination of the copper plating method and X-ray analytical microscopy

Citation
H. Kume et al., Evaluation of Si(Li) detectors by a combination of the copper plating method and X-ray analytical microscopy, IEEE NUCL S, 48(4), 2001, pp. 1012-1015
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
ISSN journal
00189499 → ACNP
Volume
48
Issue
4
Year of publication
2001
Part
1
Pages
1012 - 1015
Database
ISI
SICI code
0018-9499(200108)48:4<1012:EOSDBA>2.0.ZU;2-Y
Abstract
Copper mapping for copper-plated lithium-ion compensated Si(Li) wafers was performed by a microbeam X-ray fluorescence method. Positional distribution of copper across a cross section of the Si(Li) wafers treated at 120 degre esC for 20 h with no bias applied after complete compensation clearly showe d deviation from those that did not undergo the thermal treatment. The surf ace-barrier detectors fabricated from the thermally treated wafers were fou nd to have better energy resolution both for conversion electrons from Bi-2 07 and for cx-particles from Am-241. Correlation between the performance of the Si(Li) detectors and the lithium distribution in the intrinsic region was studied on the basis of the experimental results.