Deep electron traps created by gamma-ray irradiation of Au/GaInP Schottky d
iodes grown by metal-organic chemical vapor deposition (MOCVD) were studied
by using deep level transient spectroscopy (DLTS) technique. Three distinc
t deep electron traps, G1, G2 and G3, were observed in the irradiated GaInP
samples. According to the analysis of trap properties in various samples.
trap G1 is verified as a bulk defect located at 0.13 eV below the conductio
n band, while trap G2 and G3 are interface states originated from the junct
ions of Au/Te-doped GaInP contacts.