Comparison between static and dynamic simulations of ion reflection and sputtering from layered materials

Citation
R. Kawakami et K. Ohya, Comparison between static and dynamic simulations of ion reflection and sputtering from layered materials, JPN J A P 1, 40(9A), 2001, pp. 5399-5406
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
9A
Year of publication
2001
Pages
5399 - 5406
Database
ISI
SICI code
Abstract
Using the computer simulation program EDDY, a comparison between static and dynamic simulations of ion reflection and sputtering from layered material s is made. The D+ ion bombardment of a carbon-layered tungsten bulk materia l and vice versa serves a model for layered materials. To make the comparis on, the influence of the deposition layers on the emission processes is des cribed. The static simulation, which does not allow atomic composition chan ges in solids, gives a rapid change of such emissions owing to an increase in the thickness of the layers. Such a phenomenon is suitable for the dynam ic simulation of W-layered C because of smaller erosion and recoil implanta tion into the bulk for the W layer. For C-layered W, the dynamic simulation results show gradual changes due to larger erosion and recoil implantation of the C layer. For this reason, the thin C layer has a weak effect on the reflection coefficient and the sputtering yield of the bulk.