R. Kawakami et K. Ohya, Comparison between static and dynamic simulations of ion reflection and sputtering from layered materials, JPN J A P 1, 40(9A), 2001, pp. 5399-5406
Using the computer simulation program EDDY, a comparison between static and
dynamic simulations of ion reflection and sputtering from layered material
s is made. The D+ ion bombardment of a carbon-layered tungsten bulk materia
l and vice versa serves a model for layered materials. To make the comparis
on, the influence of the deposition layers on the emission processes is des
cribed. The static simulation, which does not allow atomic composition chan
ges in solids, gives a rapid change of such emissions owing to an increase
in the thickness of the layers. Such a phenomenon is suitable for the dynam
ic simulation of W-layered C because of smaller erosion and recoil implanta
tion into the bulk for the W layer. For C-layered W, the dynamic simulation
results show gradual changes due to larger erosion and recoil implantation
of the C layer. For this reason, the thin C layer has a weak effect on the
reflection coefficient and the sputtering yield of the bulk.