High-temperature X-ray diffraction analysis of a low-fusing dental ceramic

Authors
Assmann, S Ermrich, M Kunzmann, K
Citation
S. Assmann et al., High-temperature X-ray diffraction analysis of a low-fusing dental ceramic, J MATER SCI, 36(22), 2001, pp. 5403-5406
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
36
Issue
22
Year of publication
2001
Pages
5403 - 5406
Database
ISI
SICI code
0022-2461(200111)36:22<5403:HXDAOA>2.0.ZU;2-I
Abstract
In the present study, the leucite growth of a low-fusing dental ceramic has been investigated by high temperature X-ray diffraction analysis. The proc ess involved two heating and cooling cycles, starting with a totally amorph ous powder. Maximum leucite growth has been detected via intensity and FWHM (Full Width at the Half Maximum) analysis of the X-ray reflections at a te mperature of approximately 670 degreesC upon cooling the sample, thus indic ating a maximum CTE (Coefficient of Thermal Expansion) 110 degreesC below t he recommended firing temperature of the sample. (C) 2001 Kluwer Academic P ublishers.