Anodizing of aluminum coated with silicon oxide by a sol-gel method

Citation
K. Watanabe et al., Anodizing of aluminum coated with silicon oxide by a sol-gel method, J ELCHEM SO, 148(11), 2001, pp. B473-B481
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
11
Year of publication
2001
Pages
B473 - B481
Database
ISI
SICI code
0013-4651(200111)148:11<B473:AOACWS>2.0.ZU;2-L
Abstract
Aluminum specimens were covered with SiO2 film by a sol-gel coating and the n anodized galvanostatically in a neutral borate solution. Time variations in the anode potential during anodizing were monitored, and the structure a nd dielectric properties of the anodic oxide films were examined by transmi ssion electron microscopy, Rutherford backscattering spectroscopy, and elec trochemical impedance measurements. It was found that anodizing of aluminum coated with SiO2 films leads to the formation of anodic oxide films, which consist of an outer Al-Si composite oxide layer and an inner Al2O3 layer, at the interface between the SiO2 film and the metal substrate. The capacit ance of anodic oxide films formed on specimens with a SiO2 coating was abou t 20% larger than without a SiO2 coating. In the film formation mechanism, the conversion of Al2O3 to Al-Si composite oxide at the interface between t he inner and outer layers is discussed in terms of inward transport of Si-b earing anions across the outer layer. (C) 2001 The Electrochemical Society.