EFFECT OF INNER-SHELL EXCITATION OF DISILANE ON THE REACTION YIELD OFSYNCHROTRON-RADIATION EXCITED HIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION

The reaction yields of synchrotron-radiation excited high-vacuum chemi cal vapor deposition at the core-excitation and valence-excitation reg ions of disilane are obtained by measuring both the incident photon nu mbers of the synchrotron-radiation beams which pass through C and Al f ilters and the rates of Si deposition induced by these synchroton-radi ation beams. It is confirmed that the reaction yield for the core-exci tation energy region is about three times larger than the value for th e valence-excitation region. It is also demonstrated that synchrotron- radiation excited high-vacuum chemical vapor deposition proceeds by th e pure-photochemical reaction, not by the reaction induced by secondar y electrons due to synchrotron-radiation irradiation on the substrate. (C) 1997 American Institute of Physics.