Physical disorder and optical properties in the vacuum ultraviolet region of amorphous SiO2 - art. no. 175501

Citation
H. Hosono et al., Physical disorder and optical properties in the vacuum ultraviolet region of amorphous SiO2 - art. no. 175501, PHYS REV L, 8717(17), 2001, pp. 5501
Citations number
27
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
8717
Issue
17
Year of publication
2001
Database
ISI
SICI code
0031-9007(20011022)8717:17<5501:PDAOPI>2.0.ZU;2-X
Abstract
The optical absorption of point-defect-free SiO2 glass in the vacuum ultrav iolet region is primarily controlled by the concentrations of three- and fo ur-membered ring structures composed of heavily strained Si-O-Si bonds. The main channel of color center formation by F-2 excimer laser (7.9 eV) irrad iation is not Frenkel-defect generation of oxygen via two-photon absorption processes but a pair generation of E' and nonbridging oxygen hole centers by the one-photon excitation of these strained bonds with 7.9 eV photons.