Plasma-enhanced chemical vapor deposition of nitrides on fluidized particles

A new plasma jet fluidized bed reactor working at atmospheric pressure is p resented. The plasma arc is created inside the bed of particles in order to improve the reactivity between excited gaseous species and the particles t o be coated. Metal chlorides, nitrogen and hydrogen were used as precursors of deposited layers. TiN, Si3N4 and SiOx, coatings were deposited on silic a and corundum particles by this plasma-assisted CVD process. Optical emiss ion spectroscopy and electron microanalysis characterized the plasma and th e layer composition, respectively.