High pressure-high temperature investigation of the stability of nitride spinels in the systems Si3N4-Ge3N4

Citation
E. Soignard et al., High pressure-high temperature investigation of the stability of nitride spinels in the systems Si3N4-Ge3N4, SOL ST COMM, 120(5-6), 2001, pp. 237-242
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
120
Issue
5-6
Year of publication
2001
Pages
237 - 242
Database
ISI
SICI code
0038-1098(2001)120:5-6<237:HPTIOT>2.0.ZU;2-N
Abstract
In this study, we used laser-heated diamond anvil cell techniques coupled w ith synchrotron X-ray diffraction to investigate the synthesis and stabilit y of nitride spinels in the Si3N4-Ge3N4 system, at pressures close to 20 GP a and at temperatures up to > 2000 degreesC. The newly discovered nitride s pinels were found to be stable over the entire pressure and temperature ran ge studied. There is little incorporation Of Si3N4 component in gamma -Ge3N 4, but we observed formation of a new ternary nitride spinel (SixGe1-x)(3)N -4, with x similar to 0.6. The analysis of the X-ray patterns indicates tha t Si4+, normally considered to be the smaller ion, is strongly partitioned into the octahedral sites in the spinel phase. Excess Ge4+ ions may also oc cupy these octahedral sites in the experimental synthesis at high pressure and temperature. (C) 2001 Elsevier Science Ltd. All rights reserved.