Block copolymer thin films: Physics and applications

A two-part review of research concerning block copolymer thin films is pres ented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces th at govern film morphology. The role of film thickness and surface energetic s on the morphology of compositionally symmetric, amorphous diblock copolym er films is emphasized, including considerations of boundary condition symm etry, so-called hybrid structures, and surface chemical expression. Discuss ions of compositionally asymmetric systems and emerging research areas, e.g ., liquid-crystalline and A-B-C triblock systems, are also included. In the second section, technological applications of block copolymer films, e.g., as lithographic masks and photonic materials, are considered. Particular a ttention is paid to means by which microphase domain order and orientation can be controlled, including exploitation of thickness and surface effects, the application of external fields, and the use of patterned substrates.