A low-temperature pyroelectric study of PVDF thick films

Authors
Birlikseven, C Altintas, E Durusoy, HZ
Citation
C. Birlikseven et al., A low-temperature pyroelectric study of PVDF thick films, J MAT S-M E, 12(10), 2001, pp. 601-603
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
12
Issue
10
Year of publication
2001
Pages
601 - 603
Database
ISI
SICI code
0957-4522(200110)12:10<601:ALPSOP>2.0.ZU;2-W
Abstract
Pyroelectric coefficient measurements were made at various temperatures for poled and unpoled samples of PVDF films. Samples were produced using the s pin-coating technique onto glass substrates. Experiments were made using th e quasi-static technique. PVDF samples were poled at various electric field strengths and the relation between poling field strength and the pyroelect ric coefficient was investigated. The effect of the poling temperature was also studied. The maximum pyroelectric coefficient was obtained for a polin g temperature of 340 K and for a poling field strength of 14MVm(-1). Dielec tric permitivity and dielectric loss measurements were also performed in th e 125-375 K temperature range. (C) 2001 Kluwer Academic Publishers.