Nanoscale luminescence spectroscopy of defects at buried interfaces and ultrathin films

Authors
Citation
Lj. Brillson, Nanoscale luminescence spectroscopy of defects at buried interfaces and ultrathin films, J VAC SCI B, 19(5), 2001, pp. 1762-1768
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
1762 - 1768
Database
ISI
SICI code
1071-1023(200109/10)19:5<1762:NLSODA>2.0.ZU;2-0
Abstract
Low energy electron-excited nano-luminescence (LEEN) spectroscopy provides electronic band gap, confined state, and deep level trap information from s emiconductor surfaces and interfaces on a nanometer scale. Correlation of l uminescence features with their spatial location inside a growth structure- either depth wise or laterally-also provides information on the physical or igin and growth dependence of the electronically active defects that form. LEEN spectroscopy of localized states illustrates this approach for a repre sentative set of III-V nitride interfaces, including metal-GaN Schottky bar riers, GaN/InGaN quantum wells, GaN ultrathin films, AlGaN/GaN pseudomorphi c heterostructures across a single growth wafer, and GaN/Al2O3 interfaces. In each case, electronic properties are sensitive to the chemical compositi on, bonding, and atomic structures near interfaces and in turn to the speci fics of the growth process. (C) 2001 American Vacuum Society.