Copper ions distribution in synthetic copper-zinc hydrosilicate

Citation
Tm. Yurieva et al., Copper ions distribution in synthetic copper-zinc hydrosilicate, MAT RES INN, 5(2), 2001, pp. 74-80
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS RESEARCH INNOVATIONS
ISSN journal
14328917 → ACNP
Volume
5
Issue
2
Year of publication
2001
Pages
74 - 80
Database
ISI
SICI code
1432-8917(200110)5:2<74:CIDISC>2.0.ZU;2-6
Abstract
Copper ions distribution in the structure of synthetic copper-zinc hydrosil icate of zincsilite structure. obtained non-hydrothermal synthesis have bee n studied. Zinesilite is referred to the layered silicates of smectite grou p and is described by the formula Zn-x (Zn3-x square (x)) [Si4O10](OH)(2).n H(2)O, where Zn3-x - are the ions located in the octahedral positions of la yers, formed by two sheets of [Si4O10] tetrahedrons; Zn-x are zinc ions in the interlayer, square (x) are the cation vacancies. Two types of copper io ns were distinguished in accordance with the character of their interaction with hydrogen: (1) - substituting zinc ions in the octahedral positions of layers; (2) substituting zinc ions in the interlayer. These two types of c opper ions display the following properties when reacting with hydrogen: (1 ) - copper ions in octahedral positions start to be reduced at temperatures 553-573 K, and at 723 K reduction degree is 50%; (2) - copper ions from in terlayer start to be reduced at 503-533 K with a constant energy of activat ion. and their reduction may be complete at this temperature.