Dynamical neutron-scattering measurements of residual stress in a Si crystal coated with a thin film - art. no. 161402

The residual stress in a thick Si(111) crystal coated with a 2000 Angstrom thick Ni film was measured at the double-crystal diffractometer at Oak Ridg e National Laboratory. The observed asymmetry of the back-face rocking curv es and appearance of the garland reflections are related to the ultrasmall deformation strain induced by the Ni film. Relative deformation of the Si c rystallographic cells in the vicinity of diffractive surfaces is \ partial derivativeu(z)/partial derivativez \ approximate to1.6.10(-6). The radius o f bending is similar to 19 km and the corresponding tension force applied t o the Ni film is 90 +/-5 N/m.