Polythiophene (PTh) is of interest for transistors, light emitting diodes a
nd sensors. Plasma polymerization is a solvent-free, room temperature proce
ss that can be used to rapidly deposit thin polymer film onto a wide variet
y of substrates. This paper describes the synthesis of plasma polymerized t
hiophene (PPTh) and the dependence of molecular structure and properties on
the polymerization conditions. Transparent plasma polymerized thiophene fi
lms, deposited at about 50 nm min(-1), had a density of about 1.75 g cc(-1)
, depending on the carrier gas used (if any) and on the plasma power. The m
olecular structure consisted of opened thiophene rings and included signifi
cant amounts of unsaturation, oxygen and nitrogen. When nitrogen was used a
s a carrier gas at a low power or when a high power was used (with no carri
er gas), there was significantly more oxygen, nitrogen, and sulfur-oxygen b
onds. When a high power was used, the films exhibited a higher polar compon
ent of surface tension and a higher internal stress. The undoped films exhi
bited non-linear current-voltage (IV) behavior typical of Schottky metal-se
miconductor barriers with breakdown at reverse bias. Iodine doping yielded
ohmic IV behavior, perhaps reflecting the formation of a conducting iodine
percolation network. (C) 2001, Elsevier Science Ltd. All rights reserved.