Monte Carlo simulation of temperature dependence of X-ray diffraction intensity of Ge(001) surface with defects
Citation
Y. Nakamura et al., Monte Carlo simulation of temperature dependence of X-ray diffraction intensity of Ge(001) surface with defects, SURF SCI, 493(1-3), 2001, pp. 361-365
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
SICI code
0039-6028(20011101)493:1-3<361:MCSOTD>2.0.ZU;2-I
Abstract
We perform Monte Carlo simulations (MCS) to study the influence of surface
defects on the order-disorder phase transition of Ge(0 0 1) surface. Coupli
ng constants among the buckling of the dimers given by the recent first-pri
nciples calculations are used in the MCS. The feature of the phase transiti
on is remarkably changed by a low density of defect. The magnitude of the l
ong-range order parameter is much reduced at low temperatures as compared t
o the defect-free system. The temperature dependence of the X-ray diffracti
on intensity for the quarter-order spot specific to the c(4 x 2) structure
becomes broad. The influence of defects on the formations of local domains
of Ge(0 0 1) is well understood by analogy with that of Si(0 0 1). The expe
rimental temperature dependence of the X-ray diffraction intensity is well
reproduced by the present MCS. (C) 2001 Elsevier Science B.V. All rights re
served.