Uniform island height selection in the low temperature growth of Pb/Si(111)-(7 x 7)

Citation
M. Hupalo et al., Uniform island height selection in the low temperature growth of Pb/Si(111)-(7 x 7), SURF SCI, 493(1-3), 2001, pp. 526-538
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
493
Issue
1-3
Year of publication
2001
Pages
526 - 538
Database
ISI
SICI code
0039-6028(20011101)493:1-3<526:UIHSIT>2.0.ZU;2-X
Abstract
Self-organized, uniform-height, Pb islands with flat tops and steep edges f orm on Si(1 1 1)-(7 x 7) at low temperatures 120 < T < 250 K. Islands of he ights differing by bilayer height increments are observed depending on grow th conditions. The formation of these structures is highly unusual since at low temperatures thermal diffusion is suppressed. The origin of the regula r structures is believed to be quantum size effects (i.e. effects related t o the quantization of the electron energy levels in the islands). We have s tudied with two complementary techniques (i.e. high resolution spot profile analysis low energy electron diffraction and variable temperature scanning tunneling microscopy) how the preferred island heights depend on the growt h parameters (i.e. temperature, coverage, kinetic pathway etc.). We have co nstructed a kinetic phase diagram in the coverage-temperature plane which i ndicates the type of islands formed under different growth conditions. The phase diagram can be used as a guide so the island height can be easily con trolled. (C) 2001 Elsevier Science B.V. All rights reserved.