Structural characterization of TiCx films prepared by plasma based ion implantation

TiCx films with a wide range of C/Ti ratios have been prepared by plasma ba sed ion implantation. The bonding states and structure were investigated as functions of the relative carbon content to titanium. The results of Ruthe rford backscattering spectroscopy showed that there was more than 20 at.% h ydrogen contained in the films. By the deconvolution of X-ray photoelectron core level spectra, the excess carbon was suggested to lead to the formati on of interstitial carbon, amorphous hydrogenated carbon (or graphite), pol ymer-like carbon, and organic compound of titanium. The cross-sectional tra nsmission electron microscopy (XTEM) displayed that the TiC0.81 films mainl y consisted of rod-shaped TiC crystal arranged along the growth direction, while the TiC1.55 films contained a relatively random microstructure. XTEM also provided evidence for the existence of amorphous carbon in carbon-rich films, not graphite. (C) 2001 Elsevier Science B.V. All rights reserved.