Enabling electron diffraction as a tool for determining substrate temperature and surface morphology

Citation
Vp. Labella et al., Enabling electron diffraction as a tool for determining substrate temperature and surface morphology, APPL PHYS L, 79(19), 2001, pp. 3065-3067
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
19
Year of publication
2001
Pages
3065 - 3067
Database
ISI
SICI code
0003-6951(20011105)79:19<3065:EEDAAT>2.0.ZU;2-Y
Abstract
The reconstruction transitions for the GaAs(001) surface have been identifi ed as a function of the band gap-derived substrate temperature and As-4 bea m equivalent pressure. Surface morphology measurements using in situ scanni ng tunneling microscopy reveal that the surface spontaneously forms a rando m distribution of two-dimensional islands. The onset of island formation is coincident with the reflected high-energy electron diffraction pattern cha nging from the beta to alpha subphase of the (2x4) reconstruction. An elect ron diffraction-based method for determining the substrate temperature and engineering the surface morphology with a desired amount of roughness is pr esented. (C) 2001 American Institute of Physics.