Reflection high-energy electron diffraction studies of epitaxial oxide seed-layer growth on rolling-assisted biaxially textured substrate Ni(001): The role of surface structure and chemistry

Citation
C. Cantoni et al., Reflection high-energy electron diffraction studies of epitaxial oxide seed-layer growth on rolling-assisted biaxially textured substrate Ni(001): The role of surface structure and chemistry, APPL PHYS L, 79(19), 2001, pp. 3077-3079
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
19
Year of publication
2001
Pages
3077 - 3079
Database
ISI
SICI code
0003-6951(20011105)79:19<3077:RHEDSO>2.0.ZU;2-V
Abstract
We present a study of the {100}< 100 > biaxially textured Ni(001) surface a nd seed-layer growth using in situ reflection high-energy electron diffract ion and Auger electron spectroscopy. Our observations are consistent with f ormation of a c(2x2) two-dimensional superstructure due to the surface segr egation of sulfur contained in the metal. We show that this superstructure can have a dramatic effect on the heteroepitaxial growth of oxide seed laye rs. In particular, the surface superstructure promotes the (200) epitaxial oxide growth of Y2O3-stabilized ZrO2, which is necessary for the developmen t of high-J(c) superconducting films for coated conductors. (C) 2001 Americ an Institute of Physics.