Mechanism of bias-dependent contrast in scanning-capacitance-microscopy images

Citation
J. Smoliner et al., Mechanism of bias-dependent contrast in scanning-capacitance-microscopy images, APPL PHYS L, 79(19), 2001, pp. 3182-3184
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
19
Year of publication
2001
Pages
3182 - 3184
Database
ISI
SICI code
0003-6951(20011105)79:19<3182:MOBCIS>2.0.ZU;2-K
Abstract
In this work, the physical processes leading to contrast in scanning capaci tance microscopy (SCM) are investigated both experimentally and theoretical ly. Using a p-type epitaxial doping staircase on silicon, we show that a mo notonic dependence of the SCM signal on the doping level is only obtained, if the tip bias is adjusted in a way that the sample is either in accumulat ion or depletion. In the transition region, the SCM signal is nonmonotonic as a function of doping and depends on the bias. Therefore, any doping conc entration can yield a maximum SCM signal size. We also show that this behav ior is in agreement with the conventional model of a metal-oxide-semiconduc tor junction. (C) 2001 American Institute of Physics.