Om. Magnussen et al., In-situ atomic-scale studies of the mechanisms and dynamics of metal dissolution by high-speed STM, ELECTR ACT, 46(24-25), 2001, pp. 3725-3733
The fundamental atomic-scale processes during active metal dissolution-the
local removal/addition of atoms at atomic kinks in the steps on the crystal
surface-were directly studied by novel instrumental methods based on in-si
tu scanning tunneling microscopy (STM), using the dissolution of Cu(100) in
0.01 M HCl solution as an example. Direct observation of these rapid dynam
ic processes with a novel high-speed electrochemical STM (Video-STM), capab
le of acquiring up to 25 atomic resolution images per second, reveals that
metal dissolution proceeds at a single type of structurally well-defined ki
nks. The reactivity of these kinks is tentatively explained by the coordina
tion of Cu surface atoms and Cl adsorbates at these sites. The kinks nuclea
te predominantly at outer terraces corners and can condense into larger fac
ets, resulting in an apparent 'collective' local dissolution or growth of t
erraces. Quantitative data on the kink dynamics were obtained by an alterna
tive approach (TOW-STM) and show pronounced local dissolution/redeposition
fluctuations at the individual kinks even at the onset of Cu dissolution wi
th average kink propagation and reaction rates at kinks in the range 10(3)
and 10(5) atoms s(-1) respectively. (C) 2001 Elsevier Science Ltd. All righ
ts reserved.