Bw. Sheldon et al., Intrinsic stress, island coalescence, and surface roughness during the growth of polycrystalline films, J APPL PHYS, 90(10), 2001, pp. 5097-5103
During film growth by a variety of techniques, intrinsic tensile stresses c
an be created by the coalescence of neighboring islands. Experimental resul
ts with diamond films produced by chemical vapor deposition are compared wi
th a relatively simple model to demonstrate that a realistic interpretation
of these coalescence stresses must account for effects that are associated
with surface roughness. First, the interpretation of curvature measurement
s during the early stages of film growth must account for this surface roug
hness. Also, the experiments show that tensile stresses are induced by grai
n boundary formation during continuing growth after the initial island coal
escence event. This understanding differs from the traditional interpretati
on that continuing intrinsic stress is produced by "templated" growth onto
an already strained crystalline lattice. A kinetic model of stress evolutio
n during postcoalescence growth is also presented. (C) 2001 American Instit
ute of Physics.