We describe an optical-lithography-based sample preparation technique for m
easuring the current-perpendicular-to-plane (CPP) magnetoresistance with mi
cron-size current-contact areas on top of magnetic multilayer samples of mi
llimeter in-plane size. We use Permalloy and Co91Fe9 exchange bias spin val
ves to show that the CPP specific magnetoresistance (area times change in r
esistance) is independent of the contact area size A over the range 4 mum(2
)less than or equal toA less than or equal to1 mm(2). (C) 2001 American Ins
titute of Physics.