A compact physical model for high speed bipolar junction transistors (
BST) in integrated rf-circuits is presented. The model, which suits bo
th homo- and heterojunction devices, is based on the de Graaf-Klooster
man formalism for the modelling of BJTs, but adds important heterostru
cture device physics and incorporates also the physical properties of
the SiGe material The model implemented in APLAC circuit simulator, sh
ows good agreement between the simulation results and measured data bo
th for pure silicon BJTs and for SiGe-base heterojunction transistors.