Composition mixture probabilistic model in the formation of semiconductor materials obtained by random growth techniques

Citation
A. Iribarren et al., Composition mixture probabilistic model in the formation of semiconductor materials obtained by random growth techniques, MOD PHY L B, 15(17-19), 2001, pp. 643-646
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MODERN PHYSICS LETTERS B
ISSN journal
02179849 → ACNP
Volume
15
Issue
17-19
Year of publication
2001
Pages
643 - 646
Database
ISI
SICI code
0217-9849(20010820)15:17-19<643:CMPMIT>2.0.ZU;2-L
Abstract
During the obtaining of semiconductor materials by some growth techniques t he film structure forms randomly according to how the species arrive to the subtract. If the film is a material with three or more elements they can o rganize in several compounds, which have only local order and even become a morphous. As a consequence the physico-chemical parameters manifest non-typ ical behaviors other than in pure materials. In the present work we develop a dynamical-probabilistic model, which describes quantitatively such compo sition mixture and was applied on the behavior of the absorption profiles o f CdTeO films grown by radio frequency (rf) sputtering with different oxyge n concentrations. The model can be applied to films obtained by other growt h techniques.