A. Iribarren et al., Composition mixture probabilistic model in the formation of semiconductor materials obtained by random growth techniques, MOD PHY L B, 15(17-19), 2001, pp. 643-646
During the obtaining of semiconductor materials by some growth techniques t
he film structure forms randomly according to how the species arrive to the
subtract. If the film is a material with three or more elements they can o
rganize in several compounds, which have only local order and even become a
morphous. As a consequence the physico-chemical parameters manifest non-typ
ical behaviors other than in pure materials. In the present work we develop
a dynamical-probabilistic model, which describes quantitatively such compo
sition mixture and was applied on the behavior of the absorption profiles o
f CdTeO films grown by radio frequency (rf) sputtering with different oxyge
n concentrations. The model can be applied to films obtained by other growt
h techniques.