M-doped ZnO thin films have been prepared by the sol-gel technique, on slid
e-glass substrates. Al(NO3)(3). 9H(2)O was used as aluminum source and the
doping range was 0.001-20 at%. The effect of the Al concentration in soluti
on on the microstructure of the films is presented. The transmittance spect
ra, as well as the sheet resistance measurements, show the presence of elec
trically-active aluminum in the films.