Conductive copper sulfide thin films on polyimide foils for optical and optoelectronic applications

Citation
J. Cardoso et al., Conductive copper sulfide thin films on polyimide foils for optical and optoelectronic applications, MOD PHY L B, 15(17-19), 2001, pp. 774-777
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MODERN PHYSICS LETTERS B
ISSN journal
02179849 → ACNP
Volume
15
Issue
17-19
Year of publication
2001
Pages
774 - 777
Database
ISI
SICI code
0217-9849(20010820)15:17-19<774:CCSTFO>2.0.ZU;2-Y
Abstract
Copper sulfide thin films of 75 nm and 100 mn thickness were coated on Kapt on foils (PI) of 25 mn thickness by floating them on a chemical bath. The f oils were annealed at 150 degreesC-400 degreesC in N-2 converting the coati ng from CuS to Cu1.8S. The sheet resistance of the annealed coatings (100 n m) is 10-50 ohms/square which is almost unaltered after immersion in dilute HCl for 30-120 min. The infrared reflectance predicted for the coatings is 67%-77% at a wavelength 2.5 mum, which is nearly what is experimentally ob served. The coated PI has a transmittance (25-35%) peak located around 550- 600 nm. These thermally stable conductive coatings on PI foils might be use d as conductive substrates for optoelectronic device structures.