Dissolution in a supercritical liquid as a mechanism of laser ablation of sapphire

Citation
Si. Dolgaev et al., Dissolution in a supercritical liquid as a mechanism of laser ablation of sapphire, QUANTUM EL, 31(7), 2001, pp. 593-596
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
QUANTUM ELECTRONICS
ISSN journal
10637818 → ACNP
Volume
31
Issue
7
Year of publication
2001
Pages
593 - 596
Database
ISI
SICI code
1063-7818(200107)31:7<593:DIASLA>2.0.ZU;2-F
Abstract
The laser ablation of sapphire is studied by irradiating its interface with water and aqueous solutions of KOH, KCI and Na2CO3 by 2.92-mum 130-ns holm ium laser pulses. The ablation rate depends on the concentration and type o f the dissolved substance. The highest ablation rate is 2.5 mum per pulse f or a laser fluence of 120 J cm(-2). The ablation of sapphire is attributed to its dissolution in water or in aqueous solutions in the supercritical st ate.