Electrical characteristics of single-gate interference transistors based on various semiconductor materials

Citation
Ii. Abramov et Ai. Rahachou, Electrical characteristics of single-gate interference transistors based on various semiconductor materials, SEMICONDUCT, 35(11), 2001, pp. 1309-1313
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
35
Issue
11
Year of publication
2001
Pages
1309 - 1313
Database
ISI
SICI code
1063-7826(2001)35:11<1309:ECOSIT>2.0.ZU;2-1
Abstract
The current-voltage and high-frequency characteristics of single-gate inter ference T transistors based on quantum wires made of various semiconductors , specifically, Si, Ge, GaAs, InAs, GaSb, InSb, GaP, and InP, were studied theoretically. Two scattering mechanisms were taken into account in the T-t ransistor model in order to assess their effect on the electrical character istics of devices. The adequacy of the suggested model was verified by comp aring the results of simulation with experimental data. The calculations we re performed using the QW-NANODEV subsystem for simulating the devices base d on quantum wires. (C) 2001 MAIK "Nauka/Interperiodica".