Citation
B. Kim et W. Choi, Using wavelet filtering for monitoring plasma conditions, SOL ST TECH, 44(11), 2001, pp. 73
Citations number
14
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X
→ ACNP
Volume
44
Issue
11
Year of publication
2001
Database
ISI
SICI code
0038-111X(200111)44:11<73:UWFFMP>2.0.ZU;2-U
Abstract
Plasma states of equipment can be monitored using a wavelet in conjunction
with a radio-frequency impedance-match monitor system. This method helps pr
event any failure in plasma during etch and deposition processing, which co
uld critically diminish process performance.