Field electron emission in graphite-like films

Results of investigation of carbon films deposited with the use of gas-phas e chemical reactions in the plasma of a dc discharge are presented. Films o btained at different parameters of the deposition process varied widely in their structure and phase composition, from polycrystalline diamond to grap hite-like material. Comparative study of the structure and phase compositio n of the films using Raman spectroscopy, cathodoluminescence, electron micr oscopy, and diffractometry, as well as the obtained field electron emission characteristics, have shown that the threshold value of the electric field strength for electron emission decreases with a decrease in the size of di amond crystallites and growth of the fraction of non-diamond carbon. The lo west threshold fields (less than 1.5 V/mum) are obtained for films consisti ng mainly of graphite-like material. A model based on the experimental data is proposed, which explains the mechanism of field electron emission in ca rbon materials. (C) 2001 MAIK "Nauka/Interperiodica".