Electrode modification by electron-induced patterning of aromatic self-assembled monolayers

Self-assembled monolayers of omega-(4'-methyl-biphenyl-4-yl)-dodecyl thiol [CH3-C6H4-C6H4-(CH2)(12)-SH,BP12] on gold were patterned via exposure to 30 0 eV electrons. Subsequent copper deposition in an electrochemical cell rev ealed behavior opposite to that of electron beam patterned monolayers of al kanethiols. Whereas alkanethiols act as a positive resist and lead to coppe r deposition only on irradiated parts, the biphenyl based thiol acts as a n egative resist. At the irradiated areas the layer exhibits blocking behavio r and copper deposition is observed only on the nonirradiated parts. (C) 20 01 American Institute of Physics.