Coalescence process of monodispersed Co cluster assemblies

Cluster-cluster coalescence process of monodispersed Co clusters with mean diameter d = 8.5 and 13 nm deposited a plasma-gas-condensation-type cluster beam deposition system was investigated by in situ electrical conductivity measurements and ex situ scanning electron microscopy (SEM) and transmissi on electron microscopy (TEM), and analyzed by percolation concept. The elec trical conductivity measurement and TEM observation indicated that, below t emperature T approximate to 100 degreesC, the Co clusters in the assemblies maintain their original structure as deposited at room temperature, while that the inter-cluster coalescence takes place at T > 100 degreesC, althoug h the size distribution and the interface morphology of the clusters showed no marked change at substrate temperatures T-s less than or equal to 200 d egreesC.