Infrared near-field study of a localised absorption in a thin film

Citation
N. Gross et al., Infrared near-field study of a localised absorption in a thin film, EPJ-APPL PH, 16(2), 2001, pp. 91-98
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
ISSN journal
12860042 → ACNP
Volume
16
Issue
2
Year of publication
2001
Pages
91 - 98
Database
ISI
SICI code
1286-0042(200111)16:2<91:INSOAL>2.0.ZU;2-R
Abstract
We study the conditions to perform micro-spectroscopy with a sub-wavelength lateral resolution in the wavelength spectral range from 3 to 20 mum, taki ng advantage of the infrared spectral signature of different chemical speci es. We utilised CLIO, a free electron laser, as the photon source. The tran smitted photons were collected by either fluoride or chalcogenide glass fib res. Fibre tips were obtained through chemical etching by organic solvents. Metallisation of the tips permits to achieve lateral resolution of the ord er of the tip size. However, parasitic propagation of the light in the lm r educes the contrast between irradiated and non-irradiated zones. We exempli fy our set up with near-field infrared spectra obtained for polymer thin lm s deposited onto silicon wafers.