Low-resistance films of polyimides with impregnated copper sulfide

Citation
Rva. Rowe et al., Low-resistance films of polyimides with impregnated copper sulfide, J MATER RES, 16(11), 2001, pp. 3097-3106
Citations number
44
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
16
Issue
11
Year of publication
2001
Pages
3097 - 3106
Database
ISI
SICI code
0884-2914(200111)16:11<3097:LFOPWI>2.0.ZU;2-E
Abstract
Surface modification of polyimides has been used to obtain better interacti on with an inorganic material. Copper sulfide incorporation onto the surfac e of commercial Kapton (R) polyimide showed that treatment with base was ne cessary for adherence of the copper sulfide to the polymeric matrix. The op timized conditions for composite preparation, obtained by response surface methodology, was pH 1.4 at 80 degreesC for 3.67 h. Using these conditions, we obtained electrical resistance as low as 1.0 ohm for CuS\Kapton (R) comp osites. These optimized conditions were used to prepare other low-resistanc e polyimide composites. The resulting composites were analyzed by photoelec tron spectroscopy. The presence of S(2p) and Cu(2p) peaks demonstrated the incorporation of copper sulfide onto the polyimide surface. Scanning electr on microphotographs and the images from atomic force microscopy showed a ho mogeneous CuS distribution in all composites.