Novel route for the epitaxial growth of' (SrBa)Nb2O6 thick films by the sol-gel method using a self-template layer

Citation
Ad. Li et al., Novel route for the epitaxial growth of' (SrBa)Nb2O6 thick films by the sol-gel method using a self-template layer, J MATER RES, 16(11), 2001, pp. 3179-3183
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
16
Issue
11
Year of publication
2001
Pages
3179 - 3183
Database
ISI
SICI code
0884-2914(200111)16:11<3179:NRFTEG>2.0.ZU;2-0
Abstract
A novel sol-gel processing method has been developed to fabricate epitaxial (SrBa)Nb2O6 (SBN) thin films on MgO substrates. It involves the introducti on of a SBN self-template layer on MgO by pulsed laser deposition (PLD). Ef fects of the SBN self-template layer on the structural and morphological pr operties of the sol-gel-derived SBN films were investigated. Compared to th e sol-gel-derived SBN films without a self-template layer, our new techniqu e produces SBN films of excellent epitaxy and more dense grains with unifor m distribution. This can be explained by the self-template-layer-induced ho moepitaxial growth. The innovative processing method with combination of PL D and sol-gel is a promising technique in preparing high-quality, thick epi taxial SBN films for electro-optics device applications.