The surface segregation behavior of poly(dimethylsiloxane)/polyethylene (PD
MS/PE) and poly(dimethylsiloxane)/polypropylene (PDMS/PP) blends has been s
tudied using X-ray photoelectron spectroscopy (XPS) and atomic force micros
copy (AFM). It is shown that the overall concentration of silicon-containin
g species at the surface in these systems can be controlled by solvent wash
ing, annealing, and plasma treatment. In the case of plasma oxidation, well
-adhered SiOx coatings are produced.