Deformation behavior of thin copper films on deformable substrates

Citation
M. Hommel et O. Kraft, Deformation behavior of thin copper films on deformable substrates, ACT MATER, 49(19), 2001, pp. 3935-3947
Citations number
57
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
ACTA MATERIALIA
ISSN journal
13596454 → ACNP
Volume
49
Issue
19
Year of publication
2001
Pages
3935 - 3947
Database
ISI
SICI code
1359-6454(20011114)49:19<3935:DBOTCF>2.0.ZU;2-X
Abstract
The role of strain hardening for the deformation of thin Cu films was inves tigated quantitatively by conducting specialized tensile testing allowing t he simultaneous characterization of the film stress and the dislocation den sity as a function of plastic strain. The stress-strain behavior was studie d as a function of microstructural parameters of the films, such as film th ickness (0.4-3.2 mum), grain size and texture. It was found that the stress -strain behavior can be divided into three regimes, i.e. elastic, plastic w ith strong strain hardening and plastic with weak hardening. The flow stres ses and the hardening rate increase with decreasing film thickness and/or g rain size, and are about two times higher in (111)-grains compared to the ( 100)-grains. These effects will be discussed in the light of existing model s for plastic deformation of thin films or fine grained metals. (C) 2001 Ac ta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.