Polymeric waveguide wavelength filters using electron-beam direct writing

Authors
Citation
Wh. Wong et Eyb. Pun, Polymeric waveguide wavelength filters using electron-beam direct writing, APPL PHYS L, 79(22), 2001, pp. 3576-3578
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
22
Year of publication
2001
Pages
3576 - 3578
Database
ISI
SICI code
0003-6951(20011126)79:22<3576:PWWFUE>2.0.ZU;2-3
Abstract
Polymeric waveguide wavelength filters based on a low-loss negative tone ep oxy Novolak resin polymer have been fabricated using electron-beam direct w riting. Both the waveguides and the gratings were exposed simultaneously, w hich effectively eliminate the alignment errors that can be generated durin g fabrication. A first-order Bragg grating around 1550 nm wavelength was us ed, and a transmission peak of -27 dB was obtained with a 5 mm long grating length, corresponding to > 99% reflection. The 3 dB transmission bandwidth was found to be similar to0.8 nm and the 10 dB bandwidth was similar to1.0 nm. Dependence of the Bragg wavelength on electron-beam dosage and wavegui de width was also investigated. (C) 2001 American Institute of Physics.