Crystallization processes in different Te alloys, employed in phase change
materials for optical data storage, have been investigated by in situ mecha
nical stress measurements. Upon crystallization a considerable stress build
up is observed, which scales with the volume change upon crystallization. N
evertheless the observed stress change only corresponds to approximately 9%
of the stress estimated for a purely elastic transformation. Further evide
nce of stress relief phenomena comes from the temperature dependence of the
stress in the crystalline and amorphous states. Ultrathin dielectric layer
s have a profound influence on the crystallization process as evidenced by
simultaneous optical reflectance and mechanical stress measurements. This o
bservation can be explained by heterogeneous nucleation of crystallites at
the interface between the dielectric layer and the phase change film. (C) 2
001 American Institute of Physics.