Mechanical stresses upon crystallization in phase change materials

Citation
Tpl. Pedersen et al., Mechanical stresses upon crystallization in phase change materials, APPL PHYS L, 79(22), 2001, pp. 3597-3599
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
22
Year of publication
2001
Pages
3597 - 3599
Database
ISI
SICI code
0003-6951(20011126)79:22<3597:MSUCIP>2.0.ZU;2-1
Abstract
Crystallization processes in different Te alloys, employed in phase change materials for optical data storage, have been investigated by in situ mecha nical stress measurements. Upon crystallization a considerable stress build up is observed, which scales with the volume change upon crystallization. N evertheless the observed stress change only corresponds to approximately 9% of the stress estimated for a purely elastic transformation. Further evide nce of stress relief phenomena comes from the temperature dependence of the stress in the crystalline and amorphous states. Ultrathin dielectric layer s have a profound influence on the crystallization process as evidenced by simultaneous optical reflectance and mechanical stress measurements. This o bservation can be explained by heterogeneous nucleation of crystallites at the interface between the dielectric layer and the phase change film. (C) 2 001 American Institute of Physics.