High resolution X-ray scattering from nanotechnology materials

Citation
Bk. Tanner et al., High resolution X-ray scattering from nanotechnology materials, APPL SURF S, 182(3-4), 2001, pp. 202-208
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
182
Issue
3-4
Year of publication
2001
Pages
202 - 208
Database
ISI
SICI code
0169-4332(20011022)182:3-4<202:HRXSFN>2.0.ZU;2-Z
Abstract
The application of X-ray scattering to the non-destructive determination of physical properties of nanostructured materials is illustrated through use of three example systems. High resolution parallel beam powder diffraction is used to measure particle size and melting temperature in Sn nanoparticl es while full reciprocal space mapping allows the mosaic distribution of Co in epitaxial Ag films to be determined, The in-plane correlation length as sociated with steps on Ag surfaces and the period of artificial gratings ar e measured by grazing incidence scattering. (C) 2001 Elsevier Science B.V. All rights reserved.