Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Highly conductive and highly textured transparent CdO films are grown from a new MOCVD precursor Cd(hfa)(2)(TMEDA) (see Figure), which is prepared via a straightforward aqueous route and shown to be a monomeric, volatile, air - and thermally stable source of cadmium. XRD analysis of deposited CdO fil ms confirms an intense (200) reflection of cubic CdO, while EDX and EELS in dicate carbon and fluorine contamination to be below detection limits.Commu nication: Highly conductive and highly textured transparent CdO films are g rown from a new MOCVD precursor Cd(hfa)(2)(TMEDA) (see Figure), which is pr epared via a straightforward aqueous route and shown to be a monomeric, vol atile, air- and thermally stable source of cadmium. XRD analysis of deposit ed CdO films confirms an intense (200) reflection of cubic CdO, while EDX a nd EELS indicate carbon and fluorine contamination to be below detection li mits.