Another rate-determining step in the CVD of copper

A shift in the rate-determining step of the MOCVD of copper is investigated . The involvement of two sources of ad-species in copper deposition with a Cu-I precursor is shown to change the rate-determining step. This is from a surface dissociation reaction of adsorbed precursor at relatively low pres sures to a decomposition of an ad-species generated in the gas phase at rel atively high pressures. A rate expression over the entire pressure range is given and compared with experimental data, and there is good agreement bet ween them.