Mechanism study for thermal/electric field poling of fused silica

Authors
Citation
Xm. Lui et Md. Zhang, Mechanism study for thermal/electric field poling of fused silica, INT J INFRA, 22(11), 2001, pp. 1643-1651
Citations number
23
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES
ISSN journal
01959271 → ACNP
Volume
22
Issue
11
Year of publication
2001
Pages
1643 - 1651
Database
ISI
SICI code
0195-9271(200111)22:11<1643:MSFTFP>2.0.ZU;2-C
Abstract
On the basis of the experimental reports, the mechanism of the second-order susceptibility chi ((2)) for the thermal/electric field poling of fused si lica is analyzed, and expressions for chi ((2)) are detailedly derived and numerically calculated for the first time. By comparison the theoretical va lue of chi ((2)) with the experiment results, we propose that the effective chi ((2)) is created via both the interaction of the intense electric fiel d with the third-order susceptibility chi ((3)) and the dipole orientation. The theoretical results show that, in the differently applied voltage, the dipole orientation and chi ((3)) play different role in the formation of c hi ((2)). This theory successfully explains some experiment results.