The microstructures and electrical characteristics of Mg doped (Ba0.5Sr0.5)
TiO3 (BSTM) thin films were investigated as a function of Mg content. Also
the multi-layered structure, BSTM/BST/BSTM was proposed to improve both of
the leakage current and dielectric constant. With increasing Mg content, th
e perovskite peak intensity slightly decreased and grains became smaller. F
or the films above 15 mol% Mg, the secondary phase (MgTi2O5) was observed i
n X-ray diffraction (XRD) patterns. The dielectric constant decreased with
increasing Mg content, while leakage current decreased up to 10 mol% Mg and
then increased with further addition, which were explained by the effect o
f grain size and charge compensation. For the BSTM/BST/BSTM multi-layered f
ilms, the leakage current dramatically decreased without reduction of the d
ielectric constant when the thicknesses of BSTM and BST were 70 mn and 210
nm, respectively. These results confirm that a promising BST thin film capa
citor can be obtained by introduction of Mg modified multi-layer structure.