We investigated the mechanism of the fatigue phenomenon in ferroelectric th
in films such as Pb(Zr, Ti)O-3 (PZT) and SrBi2Ta2O9 (SBT). The fatigue phen
omenon in PZT was successfully explained by a new concept model introducing
the effect of impact-ionization and energy distribution of trap levels to
thermionic field emissions. This model can also explain the effect of appli
ed voltage and temperature on the fatigue phenomenon. Moreover, we can simu
late the fatigue characteristics in SBT by including the energy dissipation
effect on the model for PZT. By introducing this result into an extrapolat
ion method, the rewriting limit of ferroelectric thin films can be successf
ully predicted.